Run-to-Run Control in Semiconductor Manufacturing
| By: | James Moyne |
| Publisher: | Taylor & Francis |
| Print ISBN: | 9780849311789 |
| eText ISBN: | 9781351836128 |
| Edition: | 1 |
| Copyright: | 2001 |
| Format: | Reflowable |
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Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.